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UV laser marking machine(MZ-3UV/MZ-5UV/MZ-10UV/MZ-15UV)

The reaction mechanism during laser processing is achieved through photochemical ablation, which relies on laser energy to break the bonds between atoms or molecules, causing them to vaporize or evaporate into small molecules. UV laser marking is characterized by a small focused spot and a wide range of applicable materials, primarily targeting the high-end market for precision processing.

1. Equipment Features

The reaction mechanism during laser processing is achieved through
photochemical ablation, which relies on laser energy to break the bonds between
atoms or molecules, causing them to vaporize or evaporate into small molecules.
UV laser marking is characterized by a small focused spot and a wide range of
applicable materials, primarily targeting the high-end market for precision
processing.

– Excellent beam quality, smaller focused spot, minimal thermal impact, and
delicate marking;

– Most plastic materials can absorb UV laser, compensating for the
insufficient processing capabilities of other lasers;

– High marking speed and efficiency;

2.EquipmentAppearance(Reference)

ultraviolet laser marker

1) Overall Dimensions: Length 650mm * Width 800mm * Height 1500mm (subject to
actual external dimensions)

2) Chiller Dimensions: Length 580mm * Width 290mm * Height 470mm (subject to
actual external dimensions)

3) Total Weight: 120KG (subject to actual weight)

3. Technical Parameters

Item Name  

Technical Parameters    

Laser Average Power

3W@30Hz/5W@30Hz/10W@50Hz

Repetition Rate

20KHz-200KHZ

Pulse Width

<15ns

Laser Wavelength

355nm

Beam Quality M²

<1.2

Beam Divergence Angle

<2mrad

Standard Engraving Range

110mm*110mm/150mm*150mm/174mm*174mm(optional)

Recommended Engraving Speed Speed

≤5000mm/s

Minimum Line Width

0.01mm((depending on material and lens size)

Repetition Accuracy

±0.05mm

Power Requirements

220V±22V / 50Hz / 10A

Total Power Consumption

≤1000W

Cooling Method

Water Cooling

4. Hardware Configuration

Optical System

UV laser

3W/5W/10W

china

Integrated UV Laser

UV Galvanometer

10mm

china

Zhibo,Ouye,or Saipusen  

UV Focusing Lens

F254

china

Custom

Contol System

Marking Control Card

EzCAD2

china

BJJCZ

Marking Software

EzCAD2

china

BJJCZ

Industrial Computer

PC

china

/

Display  

19-inch LCD

china

Founder or Dell

Cooling System

Constant Temperature Chiller

CWUL

china

Teyu

5. Sample Images

Plastic Logo Marking Precision Exterior Part Marking Charger Marking

Plastic Logo Marking

Precision Exterior Part Marking

Charger Marking

Plastic Shell Marking 3C Product Marking Computer Keyboard Marking

Plastic Shell Marking

3C Product Marking

Computer Keyboard Marking

Samples Subject to Actual Results

6. Working Environment Requirements

1) Ambient temperature should be between 0-35°C, and air conditioning is
required;

2) Humidity should be between 45%-75%. No condensation is allowed, and a
dehumidifier should be installed;

3) Power supply requirements: 220V, 50Hz;

4) Power grid fluctuation: ±5%, and the grounding wire must comply with
international standards. In areas with voltage amplitude exceeding 5%, an
electronic automatic voltage and current stabilizer should be installed;

5) There should be no strong electromagnetic signal interference near the
installation site. Avoid radio transmission stations (or relay stations) in the
surrounding area;

6) Foundation vibration amplitude: recommended to be less than 50 µm;
vibration acceleration: recommended to be less than 0.05g. Avoid having a large
number of stamping or other machine tool equipment nearby;

7) The equipment space must be smoke-free and dust-free. Avoid environments
with severe dust, such as metal polishing or grinding;

8) Strict requirements for the quality of cooling water: purified water,
deionized water, or distilled water must be used. Tap water, mineral water, or
other liquids containing high levels of metal ions or minerals are not
allowed.

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